Superhard Cutters and Associated Methods

ABSTRACT

A cutting device comprises a base having a solidified organic material layer disposed thereon. A plurality of individual polycrystalline cutting elements are secured in the solidified organic material layer. Each of the plurality of individual polycrystalline cutting elements has a substantially matching geometric configuration.

PRIORITY DATA

This application is a continuation of U.S. patent application Ser. No.11/560,817, filed Nov. 16, 2006, which is a continuation-in-part of U.S.patent application Ser. No. 11/357,713, filed Feb. 17, 2006, whichclaims the benefit of U.S. Provisional Patent Application Ser. No.60/681,798, filed May 16, 2005; and is a continuation-in-part of U.S.patent application Ser. No. 11/223,786, filed Sep. 9, 2005; and is acontinuation-in-part of copending U.S. patent application Ser. No.10/925,894, filed Aug. 24, 2004, all of which are hereby incorporatedherein by reference in their entirety to the extent they are consistentwith the disclosure herein.

FIELD OF THE INVENTION

The present invention relates generally to cutting devices used toremove material from (e.g., plane, smooth, polish, dress, etc.) workpieces formed of various materials. Accordingly, the present inventioninvolves the fields of chemistry, physics, and materials science.

BACKGROUND OF THE INVENTION

It is estimated that the semiconductor industry currently spends morethan one billion U.S. Dollars each year manufacturing silicon wafersthat exhibit very flat and smooth surfaces. Typically, chemicalmechanical polishing (“CMP”) is used in the manufacturing process ofsemiconductor devices to obtain smooth and even-surfaced wafers. In aconventional process, a wafer to be polished is generally held by acarrier positioned on a polishing pad attached above a rotating platen.As slurry is applied to the pad and pressure is applied to the carrier,the wafer is polished by relative movement of the platen and thecarrier.

While this well-known process has been used successfully for many years,it suffers from a number of problems. For example, this conventionalprocess is relatively expensive and is not always effective, as thesilicon wafers may not be uniform in thickness, nor may they besufficiently smooth, after completion of the process. In addition tobecoming overly “wavy” when etched by a solvent, the surface of thesilicon wafers may become chipped by individual abrasive grits used inthe process. Moreover, if the removal rate is to be accelerated toachieve a higher productivity, the grit size used on the polishing padmust be increased, resulting in a corresponding increase in the risk ofscratching or gouging expensive wafers. Furthermore, because surfacechipping can be discontinuous, the process throughput can be very low.Consequently, the wafer surface preparation of current state-of-the-artprocesses is generally expensive and slow.

In addition to these considerations, the line width (e.g., nodes) of thecircuitry on semiconductors is now approaching the virus domain (e.g.,10-100 nm). In addition, more layers of circuitry are now being laiddown to meet the increasing demands of advanced logic designs. In orderto deposit layers for making nanometer sized features, each layer mustbe extremely flat and smooth during the semiconductor fabrication. Whilediamond grid pad conditioners have been effectively used in dressing CMPpads for polishing previous designs of integrated circuitry, they havenot been found suitable for making cutting-edge devices with nodessmaller than 65 nm. This is because, with the decreasing size of thecopper wires, non-uniform thickness due to rough- or over-polishing willchange the electrical conductivity dramatically. Moreover, due to theuse of coral-like dielectric layers, the fragile structure must bepolished very gently to avoid disintegration. Hence, the pressure usedin CMP processes must be reduced significantly.

In response, new CMP processes, such as those utilizing electrolysis(e.g. Applied Materials ECMP) of copper or those utilizing air filmcushion support of wafer (e.g. Tokyo Semitsu), are being pursued toreduce the polishing pressure on the contact points between wafer andpad. However, as a consequence of gentler polishing action, thepolishing rate of the wafer will decrease. To compensate for the loss ofproductivity, polishing must occur simultaneously over the entiresurface of the wafer. In order to do so, the contact points between thewafer and the pad must be smaller in area, but more numerous infrequency. This is in contrast to current CMP practice in which thecontacted areas are relatively large but relatively few in number.

Thus, in order to polish fragile wafers more and more gently, the CMPpad asperities must be reduced. However, to prevent the polishing ratefrom declining, more contact points must be created. Consequently, thepad asperities need to be finer in size but more in number. However, themore delicate the polishing process becomes, the higher the risk ofscratching the surface of the wafer becomes. In order to avoid thisrisk, the highest tips of all asperities must be fully leveled.Otherwise, the protrusion of a few “killer asperities” can ruin thepolished wafer.

SUMMARY OF THE INVENTION

The present invention provides a cutting device, including a base havinga solidified organic material layer disposed thereon, and a plurality ofindividual polycrystalline cutting elements secured in the solidifiedorganic material layer. Each of the plurality of individualpolycrystalline cutting elements can have a matching geometricconfiguration.

In accordance with another aspect of the invention, a cutting device isprovided, including a base having a solidified organic material layerattached thereto, and a plurality of individual polycrystalline cuttingelements secured in the solidified organic material layer. Each of theplurality of individual polycrystalline cutting elements can include atleast one cutting tip. The cutting tips of the cutting elements can bealigned in a common plane.

In accordance with another aspect of the invention, a method of forminga cutting device is provided, including: obtaining a substrate;arranging on the substrate a plurality of individual polycrystallinecutting elements, each of the plurality of individual polycrystallinecutting elements can have a matching geometric configuration; andsecuring each of the plurality of individual polycrystalline cuttingelements to the substrate with a solidified organic material layer.

There has thus been outlined, rather broadly, various features of theinvention so that the detailed description thereof that follows may bebetter understood, and so that the present contribution to the art maybe better appreciated. Other features of the present invention willbecome clearer from the following detailed description of the invention,taken with the accompanying exemplary claims, or may be learned by thepractice of the invention.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1A is a schematic, top plan view of a cutting device in accordancewith an embodiment of the invention;

FIG. 1B is an enlarged view of a portion of the cutting device of FIG.1A;

FIG. 2A is a schematic, top plan view of a cutting device in accordancewith another embodiment of the invention;

FIG. 2B is an enlarged view of a portion of the cutting device of FIG.2A;

FIG. 3A is a schematic, top plan view of a polycrystalline blank, and acutting device including individual polycrystalline cutting elementsformed from the blank, in accordance with an embodiment of theinvention;

FIG. 3B is an enlarged view of a portion of one cutting element of FIG.3A, taken along section B-B of FIG. 3A;

FIG. 4 is a schematic, top plan view of a polycrystalline blank, and acutting device including individual polycrystalline cutting elementsformed from the blank, in accordance with another embodiment of theinvention;

FIG. 5 is a schematic, top plan view of another polycrystalline blank inaccordance with an embodiment of the invention, shown with the blankdivided into a series of individual cutting elements;

FIG. 6 is a schematic, top plan view of a cutting device includingindividual polycrystalline cutting elements formed from the blank ofFIG. 5 in accordance with another embodiment of the invention;

FIG. 7 is a schematic, top plan view of another cutting device,including the individual polycrystalline cutting elements formed fromthe blank of FIG. 5 in accordance with another embodiment of theinvention;

FIG. 8 is a schematic, top plan view of another polycrystalline blank inaccordance with an embodiment of the invention, shown with the blankdivided into a series of individual cutting elements;

FIG. 9 is a schematic, top plan view of a cutting device, including theindividual polycrystalline cutting elements formed from the blank ofFIG. 8 in accordance with another embodiment of the invention;

FIG. 10 is a schematic, top plan view of another cutting device,including the individual polycrystalline cutting elements formed fromthe blank of FIG. 8 in accordance with another embodiment of theinvention;

FIG. 11 is a schematic, top plan view of another polycrystalline blankin accordance with an embodiment of the invention, shown with the blankdivided into a pair of individual cutting elements; and

FIG. 12 is a schematic, top plan view of a cutting device including theindividual polycrystalline cutting elements formed from the blank ofFIG. 11 in accordance with another embodiment of the invention.

It will be understood that the above figures are merely for illustrativepurposes in furthering an understanding of the invention. Further, thefigures may not be drawn to scale, thus dimensions, particle sizes, andother aspects may, and generally are, exaggerated to make illustrationsthereof clearer. Therefore, departure can be made from the specificdimensions and aspects shown in the figures in order to produce thecutting devices of the present invention.

DETAILED DESCRIPTION

Before the present invention is disclosed and described, it is to beunderstood that this invention is not limited to the particularstructures, process steps, or materials disclosed herein, but isextended to equivalents thereof as would be recognized by thoseordinarily skilled in the relevant arts. It should also be understoodthat terminology employed herein is used for the purpose of describingparticular embodiments only and is not intended to be limiting.

It must be noted that, as used in this specification and the appendedclaims, the singular forms “a,” “an” and “the” include plural referentsunless the context clearly dictates otherwise. Thus, for example,reference to “a cutting element” includes one or more of such elements.

DEFINITIONS

In describing and claiming the present invention, the followingterminology will be used in accordance with the definitions set forthbelow.

All mesh sizes referred to herein are U.S. mesh unless otherwiseindicated. Further, mesh sizes are generally understood to indicate anaverage mesh size of a given collection of particles since each particlewithin a particular “mesh size” may actually vary over a smalldistribution of sizes.

As used herein, “substantial,” or “substantially,” refers to thefunctional achievement of a desired purpose, operation, orconfiguration, as though such purpose or configuration had actually beenattained. Therefore, cutting edges or tips that are substantiallyaligned in a common plane function as though, or nearly as though, theywere precisely aligned in such a plane.

Furthermore, when used in an exclusionary context, such as a material“substantially lacking” or being “substantially devoid of” or“substantially free of” an element, the terms “substantial” and“substantially” refer to a functional deficiency of the element to whichreference is being made. Therefore, it may be possible that reference ismade to a material in which an element is “substantially lacking,” whenin fact the element may be present in the material, but only in anamount that is insufficient to significantly affect the material, or thepurpose served by the material in the invention.

As used herein, a “common plane” refers to a profile, including planaror contoured profiles, above a base surface with which the peaks or tipsof cutting elements are to be aligned. Examples of such profiles mayinclude, without limitation, flat profiles, wavy profiles, convexprofiles, concave profiles, multi-tiered profiles, and the like.

As used herein, cutting “edge” refers to a portion of a cutting elementthat includes some measurable width across a portion that contacts andremoves material from a workpiece. As an exemplary illustration, atypical knife blade has a cutting edge that extends longitudinally alongthe knife blade, and the knife blade would have to be orientedtransversely to a workpiece to scrape or plane material from theworkpiece in order for the cutting “edge” of the knife blade to removematerial from the workpiece.

As used herein, cutting “tip” refers to a portion of a cutting elementthat protrudes the greatest distance from a bonding material, e.g., thatis the first portion of the cutting element that contacts a workpiecewhen the article of the present invention is in use. It is to beunderstood that a cutting “tip” can include a planar surface, a pointedsurface, or an edge; so long as the planar surface, pointed surface oredge of the cutting element is the first portion of the cutting elementthat contacts a workpiece from which material is to be removed with acutting device to which the cutting element is attached.

As used herein, “sintering” refers to the joining of two or moreindividual particles to form a continuous solid mass. The process ofsintering involves the consolidation of particles to at least partiallyeliminate voids between particles. Sintering may occur in either metalor carbonaceous particles, such as diamond. Sintering of metal particlesoccurs at various temperatures depending on the composition of thematerial. Sintering of diamond particles generally requires ultrahighpressures and the presence of a carbon solvent as a diamond sinteringaid, and is discussed in more detail below. Sintering aids are oftenpresent to aid in the sintering process and a portion of such may remainin the final product.

As used herein, “superhard” may be used to refer to any crystalline, orpolycrystalline material, or mixture of such materials which has aMohr's hardness of about 8 or greater. In some aspects, the Mohr'shardness may be about 9.5 or greater. Such materials include but are notlimited to diamond, polycrystalline diamond (PCD), cubic boron nitride(cBN), polycrystalline cubic boron nitride (PcBN) as well as othersuperhard materials known to those skilled in the art. Superhardmaterials may be incorporated into the present invention in a variety offorms including particles, grits, films, layers, etc. However, in mostcases, the superhard materials of the present invention are in the formof polycrystalline superhard materials, such as PCD and PcBN materials.It is important to note that distinctions are made in the presentdisclosure between conventional superhard grits and polycrystallinesuperhard materials.

As used herein, “geometric configuration” refers to a shape that iscapable of being described in readily understood and recognizedmathematical terms. Examples of shapes qualifying as “geometricconfigurations” include, without limitation, cubic shapes, polyhedral(including regular polyhedral) shapes, triangular shapes (includingequilateral triangles, isosceles triangles and three-dimensionaltriangular shapes), pyramidal shapes, spheres, rectangles, “pie” shapes,wedge shapes, octagonal shapes, circles, etc.

As used herein, “organic material” refers to a semisolid or solidcomplex amorphous mix of organic compounds. As such, “organic materiallayer” and “organic material matrix” may be used interchangeably, referto a layer or mass of a semisolid or solid complex amorphous mix oforganic compounds. Preferably the organic material will be a polymer orcopolymer formed from the polymerization of one or more monomers.

As used herein, “particle” and “grit” may be used interchangeably.

As used herein, “cutting element” describes a variety of structurescapable of removing (e.g., cutting) material from a workpiece. A cuttingelement can be a mass having several cutting points, ridges or mesasformed thereon or therein. It is notable that such cutting points,ridges or mesas may be from a multiplicity of protrusions or asperitiesincluded in the mass. Furthermore, a cutting element can also include anindividual particle that may have only one cutting point, ridge or mesaformed thereon or therein.

As used herein, a plurality of items, structural elements, compositionalelements, and/or materials may be presented in a common list forconvenience. However, these lists should be construed as though eachmember of the list is individually identified as a separate and uniquemember. Thus, no individual member of such list should be construed as ade facto equivalent of any other member of the same list solely based ontheir presentation in a common group without indications to thecontrary.

Concentrations, amounts, particle sizes, volumes, and other numericaldata may be expressed or presented herein in a range format. It is to beunderstood that such a range format is used merely for convenience andbrevity and thus should be interpreted flexibly to include not only thenumerical values explicitly recited as the limits of the range, but alsoto include all the individual numerical values or sub-ranges encompassedwithin that range as if each numerical value and sub-range is explicitlyrecited.

As an illustration, a numerical range of “about 1 micrometer to about 5micrometers” should be interpreted to include not only the explicitlyrecited values of about 1 micrometer to about 5 micrometers, but alsoinclude individual values and sub-ranges within the indicated range.Thus, included in this numerical range are individual values such as 2,3, and 4 and sub-ranges such as from 1-3, from 2-4, and from 3-5, etc.This same principle applies to ranges reciting only one numerical value.Furthermore, such an interpretation should apply regardless of thebreadth of the range or the characteristics being described.

THE INVENTION

The present invention provides a cutting device and associated methodsthat can be utilized in cutting or otherwise affecting a workpiece toremove material from the workpiece and provide a finished, smooth and/orflat surface to the workpiece. Cutting devices of the present inventioncan be advantageously utilized, for example, as planing devices thatplane material from a workpiece, as dressing devices that dress variousworkpieces, and as polishing devices that polish various workpieces.

In the embodiment of the invention illustrated in FIGS. 1A and 1B, acutting device (e.g., disk) 10 a is provided that includes a base 12 athat can have a solidified organic material layer (14 in FIGS. 1B and2B) disposed thereon, attached thereto, or otherwise associatedtherewith. A plurality of individual polycrystalline cutting elements 16a can be secured in the solidified organic material layer. Each of theplurality of individual polycrystalline cutting elements can have orexhibit a substantially matching geometric configuration, e.g., thegeometric configuration of the cutting elements can substantially matchthat of other of the cutting elements. In the example illustrated inFIG. 1B, each of the plurality of individual polycrystalline cuttingelements 16 a has geometric configuration that is substantially cubic innature. In the embodiment illustrated in FIG. 2B, the individualpolycrystalline cutting elements 16 b have a geometric configurationthat can be characterized as a three-dimensional triangularconfiguration.

As illustrated in both FIGS. 1B and 2B, in one aspect of the invention,the plurality of individual polycrystalline cutting elements 16 a, 16 bcan include at least one cutting tip (18 a and 18 b, respectively), withthe cutting tips of the cutting elements being aligned in a common plane(20 a, 20 b, respectively). In this example, the common plane is a flatplane of predetermined height above the solidified organic matrix. Thus,the plurality of individual polycrystalline cutting elements can be heldwithin the solidified organic material layer in a very precise mannersuch that each of the cutting elements contacts a workpiece (not shown)from which material is to be removed at substantially the same depth. Inthis way, each of the individual polycrystalline cutting elements can besubject to substantially the same level of drag force as the cuttingdevice is moved relative to a workpiece. This feature of the inventioncan advantageously limit the premature removal of individual cuttingelements that might otherwise shorten the life of the tool, and/ordamage the workpiece being treated.

The individual cutting elements 16 a, 16 b can be formed from a varietyof materials including, in one embodiment, a polycrystalline material ora superhard polycrystalline material. While not so limited, thesuperhard polycrystalline material can be a polycrystalline diamondcompact (“PCD”) or a polycrystalline cubic boron nitride compact(“PcBN”). The PCD or PcBN compact can be formed in a variety of manners,as discussed in more detail below. By forming the individual cuttingelements from a polycrystalline material, and attaching the cuttingelements individually to the cutting device, the beneficial propertiesof polycrystalline cutting elements can be achieved without requiringthat portions of the cutting device not used for cutting also be formedfrom the polycrystalline material. Thus, considerable cost savings canbe achieved.

The cutting devices of the present invention can be utilized in a numberof applications, and in one embodiment are particularly well adapted foruse in planing substantially brittle materials, such as silicon wafers,glass sheets, metals, used silicon wafers to be reclaimed byplanarization, LCD glass, LED substrates, SiC wafers, quartz wafers,silicon nitride, zirconia, etc. In conventional silicon wafer processingtechniques, a wafer to be polished is generally held by a carrierpositioned on a polishing pad attached above a rotating platen. Asslurry is applied to the pad and pressure is applied to the carrier, thewafer is polished by relative movements of the platen and the carrier.Thus, the silicon wafer is essentially ground or polished, by very fineabrasives, to a relatively smooth surface.

While grinding of silicon wafers has been used with some success, theprocess of grinding materials such as silicon wafers often results inpieces of the material being torn or gouged from the body of thematerial, resulting in a less than desirable finish. This is due, atleast in part, to the fact that grinding or abrasive processes utilizevery sharp points of abrasive materials (which are often not levelrelative to one another) to localize pressure to allow the abrasives toremove material from a workpiece.

The PCD or PcBN cutting elements of the present invention are generallysuperhard, resulting in little yielding by the cutting elements whenpressed against a wafer. As hardness is generally a measure of energyconcentration, e.g., energy per unit volume, the PCD or PcBN compacts ofthe present invention are capable of concentrating energy to a verysmall volume without breaking. These materials can also be maintainedwith a very sharp cutting edge due to their ability to maintain an edgewithin a few atoms.

While not so required, in one embodiment of the invention shown in FIG.1A, the individual polycrystalline cutting elements 16 a can be arrangedacross the base in a grid pattern, e.g., in a pattern of squares. Thecutting elements can be evenly spaced from one another at a distance “d”of from about 100 microns to about 800 microns. In one aspect of theinvention, the individual polycrystalline cutting elements can be evenlyspaced from one another at a distance “d” of about 500 microns.

In the embodiment of the invention illustrated in FIG. 2A, theindividual polycrystalline cutting elements 16 b can be arranged acrossthe base as a series of concentric circles. As in the embodimentdiscussed above, the individual cutting elements can be evenly spacedfrom one another at a distance “d” of from about 100 microns to about800 microns. In one aspect, the individual polycrystalline cuttingelements can be evenly spaced from one another at a distance “d” ofabout 500 microns. By evenly spacing the individual cutting elements onefrom another, the drag force applied to the cutting elements during thecutting process can be evenly distributed among each of the cuttingelements, eliminating or reducing the risk of premature pullout of oneor more individual cutting elements. Premature pullout of one or moreindividual cutting elements can result in serious damage being done theworkpiece being worked upon.

The retention of an individual polycrystalline cutting element in anorganic material layer can be greatly improved by arranging the cuttingelements the organic material layer such that mechanical stressimpinging on any individual cutting element is minimized. By reducingthe stress impinging on each individual cutting element they can be morereadily retained in a solidified organic material layer, particularlyfor delicate tasks.

Various configurations or arrangements are contemplated for minimizingthe mechanical stress impinging on the cutting elements held in theabrading tool. In addition to the spacing considerations discussedabove, one potentially useful parameter may include the height that theelements protrude above the organic material layer. A cutting elementthat protrudes to a significantly greater height than other cuttingelements will experience a greater proportion of the impingingmechanical forces and thus is more prone to pull out of the solidifiedorganic material layer. Thus, an even height distribution of the cuttingelements may function to more effectively preserve the integrity of theabrading tool as compared to abrading tools lacking such an even heightdistribution.

As such, in one aspect, a majority of the plurality of individualcutting elements may protrude to a predetermined height above thesolidified organic material layer. Though any predetermined height thatwould be useful in an abrading or cutting tool would be considered to bewithin the presently claimed scope, in one specific aspect thepredetermined height may produce a cutting depth of less than about 20microns when used to abrade a workpiece. In another specific aspect, thepredetermined height may produce a cutting depth of from about 1 micronto about 20 microns when used to abrade a workpiece. In yet anotherspecific aspect, the predetermined height may produce a cutting depth offrom about 10 micron to about 20 microns when used to abrade aworkpiece. In yet another aspect, the predetermined height may produce adepth of up to or more than 50 or 100 microns.

It should also be noted that the leveling of the individual cuttingelements to a predetermined height may be dependent on cutting elementspacing. In other words, the farther the cutting elements are separated,the more the impinging forces will affect each cutting element. As such,patterns with increased spacing between the cutting elements may benefitfrom a smaller variation from predetermined height.

It may also be beneficial for the cutting elements to protrude from thesolidified organic material layer to a predetermined height or series ofheights that is/are along a designated profile. Numerous configurationsfor designated profiles are possible, depending on the particular use ofthe abrading tool. In one aspect, the designated profile may be a plane.In planar profiles, the highest protruding points of the cuttingelements are intended to be substantially level. It is important topoint out that, though it is preferred that these points align with thedesignated profile, there may be some height deviation between cuttingelements that occur due to limitations inherent in the manufacturingprocess.

In addition to planar profiles, in another aspect of the presentinvention the designated profile has a slope. Tools having slopingsurfaces may function to more evenly spread the frictional forcesimpinging thereon across the cutting elements, particularly for rotatingtools such as disk sanders and CMP pad dressers. The greater downwardforce applied by higher central portions of the tool may offset thehigher rotational velocity at the periphery, thus reducing themechanical stress experienced by cutting elements in that location. Assuch, the slope may be continuous from a central point of the tool to aperipheral point, or the slope may be discontinuous, and thus be presenton only a portion of the tool. Similarly, a given tool may have a singleslope or multiple slopes. In certain aspects, the tool may slope in adirection from a central point to a peripheral point, or it may slopefrom a peripheral point to a central point.

Various slopes are contemplated that may provide a benefit to solidifiedorganic material layer tools. It is not intended that the claims of thepresent invention be limited as to specific slopes, as a variety ofslopes in numerous different tools are possible. In one aspect, however,a CMP pad dresser may benefit from an average slope of 1/1000 from thecenter to the periphery.

As a variation on tools having a slope, in certain aspects thedesignated profile may have a curved shape. One specific example of acurved shape is a dome shape tool. Such curved profiles function in asimilar manner to the sloped surfaces. Tools may include such curvedprofiles in order to more effectively distribute the frictional forcesbetween all of the cutting elements, thus reducing failures ofindividual particles and prolonging the life of the tool.

As has been mentioned herein, while it is intended that the tips of thecutting elements align along the designated profile, some level ofdeviation may occur. These deviations may be a result of the design ormanufacturing process of the tool. Given the wide variety of sizes andshapes of cutting elements that may potentially be utilized in a giventool, such deviations may be highly dependent on a particularapplication. Also, when referring to the designated profile, it shouldbe noted that the term “tip” is intended to include the highestprotruding point of a cutting element, whether that point be an apex, anedge, or a face.

As such, in one aspect a majority of the plurality of cutting elementsis arranged such that the tips vary from the designated profile by fromabout 1 micron to about 150 microns. In another aspect, the plurality ofcutting elements are arranged such that their tips vary from thedesignated profile by from about 5 microns to about 100 microns. In yetanother aspect, the plurality of cutting elements are arranged such thattheir tips vary from the designated profile by from about 10 microns toabout 75 microns. In a further aspect, the plurality of cutting elementsare arranged such that their tips vary from the designated profile byfrom about 10 microns to about 50 microns. In another aspect, they arearranged such that their tips vary from the designated profile by fromabout 50 microns to about 150 microns. In yet another aspect, they arearranged such that their tips vary from the designated profile by fromabout 20 microns to about 100 microns. In a further aspect, they arearranged such that their tips vary from the designated profile by fromabout 20 microns to about 50 microns.

In another aspect, the plurality of cutting elements are arranged suchthat their tips vary from the designated profile by from about 20microns to about 40 microns. Additionally, in one aspect, they arearranged such that their tips vary from the designated profile by lessthan about 20 microns. In another aspect, they are arranged such thattheir tips vary from the designated profile by less than about 10microns. In yet another aspect, they are arranged such that their tipsvary from the designated profile by less than about 5 microns. In yetanother aspect, they are arranged such that their tips vary from thedesignated profile by less than about 1 micron. In a further aspect, amajority of the plurality of the cutting elements are arranged such thattheir tips vary from the designated profile to less than about 10% ofthe average size of the cutting elements.

The determination of the distance that the tips of the cutting elementsextend from the organic binder can also be affected by considering howmuch of the cutting elements extend above the binder compared to howmuch of the cutting elements remain submerged beneath the bindersurface. In the embodiment illustrated in FIGS. 1A and 1B, a ratio of anamount the cutting elements 16 a protrude above the binder to an amountsubmerged beneath the binder is about 4 to 1. In the embodimentillustrated in FIGS. 2A and 2B, about ⅔ of the cutting elements 16 b aresubmerged, with about ⅓ being exposed above the binder. Other ratios arealso possible, from a 20 to 1 ratio to about 0.2 to 1, inclusive ofranges therebetween.

By forming the individual cutting elements in the shapes describedherein, a relatively large portion of the cutting elements 16 a, 16 bcan be submerged beneath the organic binder. In this manner, the areathat affords the greatest cross section for engagement with the bindermaterial is “buried” beneath the greatest amount of binder. This featureof the invention, namely that the widest (i.e. largest cross section ofthe cutting element) is closer to one end of the particle than theother, and thus the wider end can be placed below the surface of theorganic matrix, provides great retention advantages over conventionaldiamond, or synthetic diamond, grits wherein a largest cross section ofthe grit is concentrated near a midpoint of the grit, and thus is placedat or near the surface of a matrix in which the grit is held. The widestportion may be at or near the end that is most distal from the working(e.g., cutting) end of the cutting element.

In addition to the shapes of cutting elements illustrated in thefigures, in one embodiment of the invention, the cutting elements areformed in pyramidal shapes. The present inventor has found that such aconfiguration provides a number of advantages. For example,pyramidal-shaped cutting elements concentrate most of the volume/mass ofthe cutting element toward a lowermost portion of the cutting element,ensuring that the cutting element is more securely held to whichevertype of base (e.g., cutting tool) the elements are bonded to, integratedwith, or other associated with. In addition, by forming pyramids with atriangular base, the support base of the pyramids is even more massiverelative to the tip, and the tip can be made sharper (e.g., 60 degrees)without breaking or fracturing during the dressing of CMP pads.

In general, sharper tips will cut pads faster, leading to acorresponding reduction in total dressing time. Moreover, the asperitiesformed on the pad are also sharper and more dense. Such asperities canpolish wafers, and/or dress CMP pads faster without causing undesirablenon-uniformity on the wafer. Alternatively, square pyramids can be usedwhen a lower cut rate is desired, as the tip angle likely has a largermagnitude (e.g. 90 degrees). Thus creating a wider cut path with greaterdrag and resulting in a lower cut rate. However, the square PCD cuttercan be formed more sharply than conventional, single crystal diamondgrits that have variable tip angles ranging from 90 degrees to over 125degrees. Thus, pyramids formed of polycrystalline materials aregenerally much more effective cutters, with triangular pyramids (i.e. 3sided) being particularly effective.

In addition, as the cutting elements of the present invention can bemade with very closely controlled geometry, the present polycrystallinecutting elements can cut pads with less tearing. Also, with the additionof the secondary cutting elements formed on the major cutting elements,the present cutting elements can perform even better. In contrast,single crystal grits are generally very smooth, so they can cause a lotof plastic deformation on the pad and tearing of cut “shreads.”

In addition, oftentimes pad conditioners dress pads under conditions inwhich work load is unevenly distributed across the cutting elements.Specifically, the outer rim of cutting elements often must do the mostcutting work, with the interior elements not being subject to a as higha degree of stress. One manner in which the present invention addressesthis problem is by configuring the “outer” cutting elements, some timesas PCD grits, (e.g., those located closer to the outer perimeter of thecutting or dressing tool) more robust, and/or the inner elementsslightly higher (e.g. about 10 microns higher) than the outer elements.The outer cutting elements can also be disposed on the cutting tool at agreater density, e.g., they can be spaced closer together, and/or bepositioned at a slightly lower elevation. In this design, thedistribution of cutting elements may not be in grid form, but caninclude a series of concentric rings that can be radially symmetric.

In one embodiment of the invention, the outer elements can be formedwith larger support bases relative to the cutting tips (in one aspectthey can have triangular bases), and they may also have an edge formedon the cutting tip rather than just a point. Also, the outermost cuttingelements may have a small (e.g. 50 microns) mesa formed at their cuttingtips that can cut the pad with edge of the mesa rather than with astraight edge or a point.

In one embodiment of the invention, the cutting elements can be pyramidsthat are asymmetrical in shape. For example, since the cutting force isgenerally applied from “outside to inside,” the pyramid design may havea relatively steeply sloped wall facing the outer perimeter of thecutting device, but with a relatively gentler slope (e.g. 10 degreesfrom the horizontal plane) in the trailing side. That is, the tableportion on the tip of the pyramid may not be horizontal, but may exhibita slight “tilt” toward inward to allow debris to escape more easily.This aspect of the invention differs from diamond grit cutting pads, assuch conventional cutting pads include a negative angle such that thetearing or cutting force is superimposed with a compressive force. Thisembodiment of the invention can allow cutting without a great deal ofcompression so the removal of pad “shread” is much easier.

In other words, the present invention allows a majority of the energyconsumed to be used in cutting, rather than plastic deformation. Thisadvantage can be further improved upon by forming the vertical wall ofthe pyramids such that they slope slightly less than 90 degrees (e.g.,about 80 degrees). In this case the table of the pyramids can be sharperon the top of the mesa, similar to an inverted pyramid. This can improvethe efficiency of pad cutting because the cutting is performed with apositive angle, similar to a razor blade used in shaving. Such a designhas not been possible with single crystal diamond designs, as thecutting edge contact with such designs is always negative in angle. Thepresent pyramidal cutting elements can provide positive cutting edgesthat are not subject to premature failure due, at least in part, to itsability to support such a cutting edge with a more gently sloping wallon the trailing side of the cutting interface (e.g., with theasymmetrical shape of the pyramids). In one aspect, such an asymmetrycan be formed by wire-EDM cutting, and it can be formed with pyramidswith tips of point, edge, and mesa tops. Also, when the cutting elementsare individual particles or grits, such particle or grit can receive theintended configuration, including an asymmetrical configuration asdescribed above by using a mold with a proper shape for processing ofthe PCT particle.

In one embodiment of the invention, the spacing of the pyramids can beadjusted to adjust the contact pressure of each cutting point, edge ormesa. In general, the farther the pyramids are spaced from one another,the higher the contact pressure between the pyramid and the pad. Thus,the fewer tips present to support the applied force, the deeper thepenetration of each of the tips and the larger the formed asperities.Generally, the polishing rate of the wafer is dependent on the numberand size of the asperities. Denser, smaller asperities can polish asfast as fewer, larger asperites. But the former is more uniform with noexcessive force that may cause non-uniformity, scratching, erosion ordishing of the delicate wafer, etc. This can be particularly true withcopper smaller than 90 nm and with low-k dielectric having greater than20% pores.

The individual polycrystalline cutting elements can be formed in avariety of manners and from a variety of materials, as would occur toone having ordinary skill in the relevant art. In one aspect of theinvention, the cutting elements are sintered polycrystalline diamondcubes with silicon/SiC as the matrix. Each of the cubes can containabout 90 V % of diamond (about 10 microns in grain size) and theremaining phase can be either silicon or SiC. A very small amount oftitanium can be used facilitate the sintering process. The cubes can bepressed in a graphite mold and formed in a size of about 1 mm on eachside. While the cubic examples provided above have proven particularlyefficacious, it is to be understood that a variety of sizes andconfigurations of polycrystalline materials can be utilized in thepresent invention.

By forming the cutting elements from individual units of superhardpolycrystalline material, in defined geometric shapes, arrangement ofthe cutting elements in a very precise manner becomes much easier. Asthe defined geometric shapes can be replicated fairly precisely from onecutting element to another, the positioning of, and accordingly, thestress impinged upon, each cutting element can be accomplished fairlyconsistently across the face off the cutting device in question. Withprior art abrasive grits, for example, the overall shape and size ofeach a plurality of grits might change considerably from one grit toanother, making precise placement of the grits difficult to accomplish.

The material utilized in the organic material layer 14 can vary widely.Numerous organic materials are known to those skilled in the art whichwould be useful when utilized in embodiments of the present invention,and are considered to be included herein. The organic material layer canbe any curable resin material, resin, or other polymer with sufficientstrength to retain the individual polycrystalline cutting elements ofthe present invention. It may be beneficial to use an organic materiallayer that is relatively hard, and maintains a flat surface with littleor no warping. This allows the abrading tool to incorporate very smallindividual polycrystalline cutting elements at least partially therein,and to maintain these small cutting elements at relatively level andconsistent heights.

Additionally, various organic materials may act to absorb mechanicalforces impinging on the cutting elements disposed therein, and thusspread and equalize such forces across the abrading tool.

Methods of curing the organic material layer can be any process known toone skilled in the art that causes a phase transition in the organicmaterial from at least a pliable state to at least a rigid state. Curingcan occur, without limitation, by exposing the organic material toenergy in the form of heat, electromagnetic radiation, such asultraviolet, infrared, and microwave radiation, particle bombardment,such as an electron beam, organic catalysts, inorganic catalysts, or anyother curing method known to one skilled in the art.

In one aspect of the present invention, the organic material layer maybe a thermoplastic material. Thermoplastic materials can be reversiblyhardened and softened by cooling and heating respectively. In anotheraspect, the organic material layer may be a thermosetting material.Thermosetting materials cannot be reversibly hardened and softened aswith the thermoplastic materials. In other words, once curing hasoccurred, the process is essentially irreversible.

Organic materials that may be useful in embodiments of the presentinvention include, but are not limited to: amino resins includingalkylated urea-formaldehyde resins, melamine-formaldehyde resins, andalkylated benzoguanamine-formaldehyde resins; acrylate resins includingvinyl acrylates, acrylated epoxies, acrylated urethanes, acrylatedpolyesters, acrylated acrylics, acrylated polyethers, vinyl ethers,acrylated oils, acrylated silicons, and associated methacrylates; alkydresins such as urethane alkyd resins; polyester resins; polyamideresins; polyimide resins; reactive urethane resins; polyurethane resins;phenolic resins such as resole and novolac resins; phenolic/latexresins; epoxy resins such as bisphenol epoxy resins; isocyanate resins;isocyanurate resins; polysiloxane resins including alkylalkoxysilaneresins; reactive vinyl resins; resins marketed under the Bakelite tradename, including polyethylene resins, polypropylene resins, epoxy resins,phenolic resins, polystyrene resins, phenoxy resins, perylene resins,polysulfone resins, ethylene copolymer resins,acrylonitrile-butadiene-styrene (ABS) resins, acrylic resins, and vinylresins; acrylic resins; polycarbonate resins; and mixtures andcombinations thereof. In one aspect of the present invention, theorganic material may be an epoxy resin. In another aspect, the organicmaterial may be a polyimide resin. In yet another aspect, the organicmaterial may be a polyurethane resin. In yet another aspect, the organicmaterial may be a polyurethane resin.

Numerous additives may be included in the organic material to facilitateits use. For example, additional crosslinking agents and fillers may beused to improve the cured characteristics of the organic material layer.Additionally, solvents may be utilized to alter the characteristics ofthe organic material in the uncured state. Also, a reinforcing materialmay be disposed within at least a portion of the solidified organicmaterial layer. Such reinforcing material may function to increase thestrength of the organic material layer, and thus further improve theretention of the individual polycrystalline cutting elements. In oneaspect, the reinforcing material may include ceramics, metals, orcombinations thereof. Examples of ceramics include alumina, aluminumcarbide, silica, silicon carbide, zirconia, zirconium carbide, andmixtures thereof.

Additionally, in one aspect a coupling agent or an organometalliccompound may be coated onto the surface of each superabrasive particleto facilitate the retention of the superabrasive particles in theorganic material matrix via chemical bonding. A wide variety of organicand organometallic compounds are known to those of ordinary skill in theart and may be used. Organometallic coupling agents can form chemicalsbonds between the superabrasive particles and the organic materialmatrix, thus increasing the retention of the particles therein. In thisway, the organometallic coupling agent acts as a bridge to form bondsbetween the organic material matrix and the surface of the superabrasiveparticles. In one aspect of the present invention, the organometalliccoupling agent can be a titanate, zirconate, silane, or mixture thereof.

Specific non-limiting examples of silanes suitable for use in thepresent invention include: 3-glycidoxypropyltrimethoxy silane (availablefrom Dow Corning as Z-6040); γ-methacryloxy propyltrimethoxy silane(available from Union Carbide Chemicals Company as A-174);β-(3,4-epoxycyclohexyl)ethyltrimethoxy silane, γ-aminopropyltriethoxysilane, N-(β-aminoethyl)-γ-aminopropylmethyldimethoxy silane (availablefrom Union Carbide, Shin-etsu Kagaku Kogyo K.K., etc.); and additionalexamples of suitable silane coupling agents can be found in U.S. Pat.Nos. 4,795,678, 4,390,647, and 5,038,555, which are each incorporatedherein by reference.

Specific non-limiting examples of titanate coupling agents include:isopropyltriisostearoyl titanate, di(cumylphenylate)oxyacetate titanate,4-aminobenzenesulfonyldodecylbenzenesulfonyl titanate, tetraoctylbis(ditridecylphosphite) titanate, isopropyltri(N-ethylamino-ethylamino)titanate (available from Kenrich Petrochemicals. Inc.), neoalkyoxytitanates such as LICA-01, LICA-09, LICA-28, LICA-44 and LICA-97 (alsoavailable from Kenrich), and the like.

Specific non-limiting examples of aluminum coupling agents includeacetoalkoxy aluminum diisopropylate (available from Ajinomoto K.K.), andthe like.

Specific non-limiting examples of zirconate coupling agents include:neoalkoxy zirconates, LZ-01, LZ-09, LZ-12, LZ-38, LZ-44, LZ-97 (allavailable from Kenrich Petrochemicals, Inc.), and the like. Other knownorganometallic coupling agents, e.g., thiolate based compounds, can beused in the present invention and are considered within the scope of thepresent invention.

The amount of organometallic coupling agent used depends on the couplingagent and on the surface area of the individual polycrystalline cuttingelements. Typically, 0.05% to 10% by weight of the organic materiallayer is sufficient.

Turning now to FIG. 3A, in one aspect of the invention, the individualpolycrystalline cutting elements can be obtained and/or formed from apolycrystalline blank of material. One such blank of material is shownat 30 in FIG. 3A, with the polycrystalline blank being formed in a diskhaving a diameter of roughly 30 mm and a thickness that can vary fromaround 0.2 mm to upwards of 2 mm.

The disk 30 can be divided into a series of individual cutting elementsin a variety of manners known to those having ordinary skill in the art,including, without limitation, electro-chemical machining, by laserablation, by plasma etching, by oxidation (to form carbon dioxide ormonoxide gas), hydrogenation (to form methane gas), etc. Laser beamswith relatively longer wavelengths (e.g. ND:YAG) have been shown to formcutting grooves on PCD effectively (laser beams with relatively shortwavelengths (e.g. excimers) may be used to carve out the secondarycutting elements on top of the primary cutting elements, as shown anddiscussed in connection with FIG. 3B. While the latter may be slower incutting speed, it is generally more precise due to the shorterwavelength used. Moreover, the surface damage can be less with moreconcentrated energy in higher frequencies. This has been found suitablefor shaving or planing a silicon wafer in accordance with the presentinvention.

In one aspect of the invention, the material is removed from the PCD orPcBN compact by electrical discharge machining (“EDM”). In this aspect,the EDM process can utilize one or more electrodes that include diamond.For example, the cathode used in the EDM process can be a boron dopeddiamond material and the anode used in the EDM process can be the PCD(in this case, the PCD would generally need to be at least partiallyelectrically conductive). As current is applied through the boron dopeddiamond material, the material of the PCD can be carefully andcontrollably removed to form various cutting elements from the PCD.

As will be appreciated, the disk 30 is divided into 8 similarly shapedand sized wedges 32. In one embodiment of the invention, the wedges 32can be attached to a base 12 b by way of the solidified organic materiallayer discussed above. In the embodiment of the invention illustrated inFIG. 3A, the wedges 32 are radially distributed about the face of thecutting device and/or base or substrate. In this manner, the wedges 32can be arranged so as to each be subject to substantially the same force(and each be substantially as likely to be retained within the organicmatrix) when used to abrade or treat a workpiece (not shown). While notso required, in one embodiment of the invention, the PCD blank 30 can beon the order of about 30 mm in diameter, while the base 12 b can be onthe order of about 100 mm in diameter. Thus, a cutting device with adiameter of around 100 cm can be formed from superhard material takenfrom a PCD of only about 30 mm.

As shown in FIG. 4, in one aspect of the invention, a longitudinal axisof each of the individual polycrystalline cutting elements (e.g., wedges32) is aligned along a radius R of the cutting device. In the embodimentshown, the individual polycrystalline cutting elements are distributedon the cutting device in alternating orientations. The manner ofarranging the cutting elements across the face of the base or substrate12 b can be varied for particular applications. Due to the consistentshape and size of the individual polycrystalline cutting elements,however, arrangement and attachment of the cutting elements to the baseis made considerably easier. Accordingly, varying the arrangement forparticular applications can be more easily and accurately accomplished.

By utilizing a relatively small amount of polycrystalline material(e.g., disk 30), relative to the size of the base 12 b which is to beused to treat the workpiece (not shown), the amount polycrystallinematerial used can be greatly reduced, leading to considerable costsavings. The present inventor has found, however, that cutting devicesof the present invention perform equally well, or nearly equally aswell, as conventional cutting devices that utilize “full-face”polycrystalline cutting or grinding tools.

As will be appreciated, the blank 30 of FIG. 3A has been divided into 8equal portions. However, as shown in FIGS. 5 through 12, the disks 30 b,30 c and 30 d can be divided into twelve equal portions (represented bywedges 32 b), sixteen equal portions (represented by wedges 32 c), twoequal portions (represented by wedges 32 d), and so forth. In thismanner, the present invention provides additional flexibility forcreation and arrangement of the individual polycrystalline cuttingelements across the tool. It is contemplated that a variety of otherconfigurations is also possible, including, without limitation,differently sized and shaped individual polycrystalline cuttingelements.

Returning to FIG. 3B, in one aspect of the invention, the individualpolycrystalline cutting elements 32 can include a series of secondarycutting elements 40 formed on a face of each of the individualpolycrystalline cutting elements. The secondary cutting elements can beconfigured to maintain a sharpness of each of the cutting elementsduring use of the cutting device. The secondary cutting elements canvary in shape, and can include rectangular-shaped cutting elements,pyramidal-shaped cutting elements, triangular-shaped cutting elements,etc. The secondary cutting elements can also be formed in a truncatedpyramidal shape (not shown). By utilizing secondary cutting elements onthe primary cutting elements, the total cutting edge length of thecutting element can be extended by as much as 10,000 times.

In accordance with another aspect, the present invention provides amethod of forming a cutting device, comprising: obtaining a substrate;arranging on the substrate a plurality of individual polycrystallinecutting elements, each of the plurality of individual polycrystallinecutting elements having a matching geometric configuration; and securingeach of the plurality of individual polycrystalline cutting elements tothe substrate with a solidified organic material layer.

The method can further comprise aligning at least one cutting tip ofeach of the plurality of individual polycrystalline cutting elements ina common plane.

EXAMPLES

The following examples present various methods for making the cuttingtools of the present invention. Such examples are illustrative only, andno limitation on present invention is meant thereby.

Example 1

Individual sintered polycrystalline diamond cubes with silicon/SiC asthe matrix were used as the cutting elements for forming a CMP padconditioner. Each of the cubes contains about 90 V % of diamond (about10 microns in grain size) and the remaining phase is either silicon orSiC. A very small amount of titanium is also present to facilitate thesintering process. The cubes were pressed in a graphite mold and wereformed in a size of about 1 mm on each side.

An epoxy mold was provided with cavities configured to receive one apexof the PCD cubes. A parting layer was spread on top of the mold.Subsequently, another epoxy is cast on the top in vacuum. After curing,the mold is removed, exposing the apex of each cube. The apexes becomethe cutting tip of a pad conditioner.

Example 2

A disk of sintered polycrystalline diamond with silicon/SiC as thematrix is divided into a series of wedges of substantially the samevolume. The wedges are used as the cutting elements for forming a CMPpad conditioner. Each of the wedges contains about 90 V % of diamond(about 10 microns in grain size) and the remaining phase is eithersilicon or SiC. A very small amount of titanium is also present tofacilitate the sintering process.

An epoxy mold was provided with cavities configured to receive each ofthe PCD wedges. A parting layer was spread on top of the mold.Subsequently, another epoxy is cast on the top in vacuum. After curing,the mold is removed, exposing the face of each wedge. The faces (andedges of the faces) of the wedges become the cutting elements of a padconditioner.

Example 3

PCD blanks pressed from a cubic press were trimmed from both sides toremove refractory metal container (e.g. Ta). The outside diameter of theblanks were ground off. The PCD blanks were bonded to a cemented WC baseand the PCD layer was EDM shaped to form pyramids distributed in apredetermined pattern. The PCD blanks were subsequently divided into aseries of wedge-shaped cutting pieces and the cutting pieces were placedon a flat mold with the cutting pieces leveled with the mold.

The mold was placed in a vacuum chamber and epoxy is poured over thetop. Finally, a stainless steel plate was placed on the top of theflowing epoxy and pressed toward the PCD until only a thin layer ofepoxy remained between the backing of the PCD and the steel substrate.After curing of the epoxy, the PCD cutting tool was cleaned and mountingstructure (e.g., holes) was formed on the back of the steel substrate.

The PCT cutting pieces can be arranged on the stainless steel plate inan annular ring pattern, circular plates, squares, etc. These patternscan be optimized to suit a particular CMP application.

It is to be understood that the above-described arrangements are onlyillustrative of the application of the principles of the presentinvention. Numerous modifications and alternative arrangements may bedevised by those skilled in the art without departing from the spiritand scope of the present invention and the appended claims are intendedto cover such modifications and arrangements. Thus, while the presentinvention has been described above with particularity and detail inconnection with what is presently deemed to be the most practical andpreferred embodiments of the invention, it will be apparent to those ofordinary skill in the art that numerous modifications, including, butnot limited to, variations in size, materials, shape, form, function andmanner of operation, assembly and use may be made without departing fromthe principles and concepts set forth herein.

1. A CMP pad dresser comprising: a base having a solidified organicmaterial layer disposed thereon; and a plurality of individual superhardpolycrystalline cutting elements, each with a substantially matchinggeometric configuration, secured in the solidified organic materiallayer with a widest portion positioned below the organic material layersurface, and a cutting tip aligned in a common plane above the organicmaterial layer surface.
 2. The CMP pad dresser of claim 1, wherein thewidest portion of each cutting element is closer to one end of thecutting element than to another end of the cutting element.
 3. The CMPpad dresser of claim 2, wherein the widest portion of each cuttingelement is at or near an end most distal from the cutting tip.
 4. TheCMP pad dresser of claim 1, wherein the cutting elements have apyramidal shape.
 5. The CMP pad dresser of claim 4, wherein thepyramidal shape is asymmetrical.
 6. The CMP pad dresser of claim 4,wherein the pyramidal shape is a three-sided pyramid with a cutting tipof 60 degrees.
 7. The CMP pad dresser of claim 4, wherein the pyramidalshape is a square pyramid with a cutting tip of 90 degrees.
 8. The CMPpad dresser of claim 7, wherein the square pyramid shape is provided bya cube oriented with a 90 degree corner as a cutting tip in the commonplane above the organic material layer surface.
 9. The CMP pad dresserof claim 1, wherein a ratio of the portion of the cutting elementpositioned below the organic material layer surface as compared to theportion of the cutting element protruding above the organic materiallayer surface is from 20 to 1 to about 0.2 to
 1. 10. The CMP pad dresserof claim 8, wherein the ratio is about 4 to
 1. 11. The CMP pad dresserof claim 8, wherein about ⅔ of the cutting element is positioned belowthe organic material layer surface and about ⅓ of the cutting element isprotrudes above the organic material layer surface.
 12. The CMP paddresser of claim 1, further comprising secondary cutting elements formedon the polycrystalline cutting elements.
 13. The CMP pad dresser ofclaim 1, wherein the superhard polycrystalline cutting elements areeither sintered polycrystalline diamond or polycrystalline cubic boronnitride.
 14. The CMP pad dresser of claim 1, wherein the organicmaterial layer is a curable resin material.
 15. The CMP pad dresser ofclaim 14, wherein the curable resin material is a thermoplasticmaterial.
 16. The CMP pad dresser of claim 14, wherein the curable resinmaterial maintains a flat surface with little or no warping.
 17. The CMPpad dresser of claim 1, wherein the solidified organic material layerfurther comprises a reinforcing material.
 18. The CMP pad dresser ofclaim 17, wherein the reinforcing material includes ceramics, metals, ora combination thereof.
 19. The CMP pad dresser of claim 18, wherein thereinforcing material is a ceramic.
 20. The CMP pad dresser of claim 1,further comprising an organometallic coupling agent coated on thesuperhard polycrystalline cutting elements to chemically bond thecutting elements to the solidified organic material layer.